Analysis Chamber (AC)

Residual magnetic field at the sample point

Ultimate pressure

Electron energy analyzer

Mean radius of electron path

Kinetic Energy Range

Pass Energy

Energy Resolution

Angular Resolution

Lens Modes

Acquisition Modes

Manipulator

Sample scanning range

Motion range

Tilt range

X-ray source

Spot size

Monochromators

Photon energy

X-ray photon flux

UV Source

Total flux

Suitable Gases

Excitation source

Accessory

Baking system

Control system

SPECIFICATIONS

Analysis Chamber

SUS316L stainless steel chamber with one μ-metal shields

≤20mGauss guaranteed；≤5mGauss achievable

≤5 ×10^-9 mbar（with ion pump and turbomolecular pump

R150X

150mm

1 eV ~ 1500 eV

1 ~ 500 eV， multi options

≤50 meV FWHM @ Ep = 2 eV，Ek = 9.1 eV

≤ 0.1°@ 0.1 mm spot size

Transmition Mode（Angular Mode optional）

Fixed Mode，Swept Mode

Fully motorized five-axes sample stage

60 mm diamete

X：±25 mm, Y：±25mm , Z：0~15 mm; Azimuth rotation：0~360°

0°~ 90°for angular resolved analysis，rotation accuracy：≤±1°

μXR275

100μm guaranteed（10μm achievable）

Quartz crystal

Al target @ 15 kV

≥1×10^10 phs/s

VUV430-AF

≥1×10^14 phs/s

He, Ne, Ar, Kr, Xe.....

Solid state RF generator

Argon Ion Gun、Neutralizer gun......

Up to150°C

PLC based vacuum display，control and protection system

Manipulator

UV Source

Supporting system

X-ray source

* The data on this page is measured by Csi-Lab .