VUV430-AF-MONO

Csi-Lab VUV430-AF is a stable plasma EUV light source, directly generated by a radio frequency microwave. It is suitable for He, Xe, Kr and other noble gases.

Csi-Lab VUV430-AF -Mono equipped with monochromator, generated the monochromatic EUV light, is suitable for ARPES application

With an elliptical focusing system, the high flux and micro-focused EUV spot is reachable

SPECIFICATIONS

Operating Gases

Excitation source

Cooling method

Total photon flux

Resolution

Monochromators

Differential pumping

Focusing system

Filter

Supporting frame

He，Ne，Ar，Kr，Xe....

200W solid state RF generator

Water only (low noise)

≥1×10^14 phs/s

< 1meV @ Xe (8.43 eV)； ~1meV @ HeIα(21.218 eV)；~2meV @ HeIIα (40.814 eV)；

Toroidal grating or Double crystal monochromator

Three-stage differential pumping system

500μm @Elliptic focusing capillary; 100μm @micro-focusing optics

Dual-valves structure is available for mounting EUV filter

Adjustable frame for optimize the focusing and position

Operation

Performance

Mounting

* The data on this page is measured by Csi-Lab.